September 2022

Conference Paper

Atomic-Scale Imaging of Polarization Switching in an (Anti-)Ferroelectric Memory Material: Zirconia (ZrO2)

By:
Lombardo, Sarah F; Nelson, Christopher T; Chae, Kisung; Reyes-Lillo, Sebastian; Tian, Mengkun; Tasneem, Nujhat; Wang, Zheng; Hoffman, Michael; Triyoso, Dina; Consiglio, Steven; Tapily, Kanda; Clark, Robert; Leusink, Gert; Cho, Kyeongjae; Kummel, Andrew; Kacher, Joshua; khan, Asif
Journal Name:
IEEE Symposium on VLSI Technology
Page Number:
1-2
Issue Number:
na
Book Title:
2020 IEEE Symposium on VLSI Technology
Publication Date:
September 2, 2022
Publisher Location:
IEEE, New Jersey, United States of America
Conference Name:
2020 IEEE Symposium on VLSI Technology
Conference Location:
Honolulu, Hawaii, United States of America
Conference Sponsor:
IEEE
View DOI Listing:
https://doi.org/10.1109/VLSITechnology18217.2020.9265091

Abstract

Direct, atomic-scale visualization of polarization switching in a functional, polycrystalline, binary oxide via in-situ high-resolution transmission electron microscopy (HRTEM) biasing is reported for the first time. Antiferroelectric (AFE) ZrO2 was used as the model system, which is important for commercial DRAMs and as emerging NVMs (through work-function engineering). We observed (1) clear shifting and coalescing of domains within a single grain, and (2) dramatic changes of the atomic arrangements and crystalline phases—both at voltages above the critical voltage measured for AFE switching. Similar synergistic in-situ structural-electrical characterization can pave the way to understand and engineer microscopic mechanisms for retention, fatigue, variability, sub-coercive switching and analog states in ferroelectric and AFE-based memory devices.


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