April 2008

Journal

Excimer Laser Etching

By:
Boatner, Lynn A; Longmire, Hu F; Rouleau, Christopher M; Gray, Allison S
Journal Name:
Advanced Materials and Processes
Page Number:
39-39
Volume:
166
Issue Number:
4
Publication Date:
April 16, 2008

Abstract

Excimer laser radiation at a wavelength of = 248 nm represents a new etching method for the preparation of metallographic specimens. The method is shown to be particularly effective for enhancing the contrast between different phases in a multiphase metallographic specimen.


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