Process for Increasing Electrical Activation of Ion Implanted Dopants

INVENTION REFERENCE NUMBER

200100957

  • Materials

A vacancy-generating dual-ion-implantation process enhances the electrical activation of a previously implanted dopant.


Inventors

Tony E Haynes Materials Science and Technology Div, Vincent C Venezia Neutron Sciences Directorate


Contact

To learn more about this technology, email [email protected] or call 865-574-1051.